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Ruthenium target,Ru sputtering target

Rhenium series

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Ruthenium target,Ru sputtering target

Purity: 99.95%
Ruthenium target is mainly used in the field of vacuum coating
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Product description
Parameters

Application

Ruthenium target is mainly used in the field of vacuum coating

 

Product specifications

 

Physical properties

Color

Hard, brittle silver rare metal
Density

12.37g/cm³

Melting point

2250℃

Technical index

Purity

99.95%

Relative density

>99%

Flatness of section

3.2Ra

Tolerance

±0.1mm

Grain size Evenly
Material

Ru

Product specifications Specification 01 Multi-arc target: diameter<1000mm thickness>1mm
Specification 02 Rectangle: Length: Unlimited Width: Unlimited Thickness: Unlimited Rectangular/sheet/step (length and width can be spliced)
Specification 03 Cylinder: outer diameter <420mm inner diameter>1mm wall degree>1mm length>1mm (pipe/ring/rotating target)
Specification 04: particle ball type, powder type
Specification 05: Customized according to user needs, processing with samples and drawings
Minimum order quantity 1 piece, large quantity discount
Delivery date Large quantities of raw materials in various sizes are available for long-term supply and reliable quality.
Craftsmanship Vacuum magnetic levitation smelting, casting into ingots, thermomechanical treatment and precision machining

Application

Vacuum coating, experimental or research grade ruthenium targets, electronics, optoelectronics, military, decorative plating, functional films, etc.
Product advantages Reliable quality and favorable price
Vacuum smelting, purification preparation, high purity, less impurities
Dense rolling, less oxidation, plastic molding
Relatively high density, uniform and equiaxed crystal grains, high consistency
Product accessories Formal quotation/purchase and sales contract/packing list/material analysis and inspection list/formal invoice
Packing Vacuum packaging

 

Typical chemical analysis

 Impurities(ppm)

Os

Pt

Ni

Fe

Si

Pd

Ti

As

4

2

2

5

8

2

2

2

Bi

Cu

Zr

Ca

Zn

Se

Mg

 

2

2

2

2

2

2

2

 

Impurities (below the detection range of the instrument)(ppm)

V

Sn

Rh

Ir

Mo

Ag

Cd

Sb

<2

<2

<2

<2

<2

<2

<2

<2

Mn

Al

Co

Te

Au

B

Pb

Cr

<2

<2

<2

<2

<2

<2

<2

<2

Keyword:
Ruthenium target
Ru sputtering target
We could not find any corresponding parameters, please add them to the properties table
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