Purity: 99.95%
Ruthenium target is mainly used in the field of vacuum coating

High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5N or 6N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.

Tungsten-Ni-Cr/Tungsten-Ni-Cr/Ni-Cr targets are mostly used in the special glass coating industry, and the technical specifications can be customized.

Purity: 3N5
Size: 1-10 inches, unconventional size can be customized.

Purity：99.95%，round ,square
Size：diameter Φ50~170mm thickness 3~15mm

Chemical purity: 99.95%
Size: Diameter 20～300mm, thickness 1～60mm, customized according to requirements

High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.

Pt≥99.95%
Diameter 20～300mm, thickness 1～60mm according to requirements

it is widely used in the field of semiconductor integrated circuit, flat panel display and thin film solar panel manufacturing

Tantalum sheets and tantalum plates can be used to manufacture various inorganic acid preparation equipment, corrosion-resistant fasteners, supporting accessories, heat shields, heaters and heat sinks in high-temperature vacuum furnaces, water tanks, bridges and other steel Structure of the cathodic protection system.