Rhenium sputtering target manufacturers tell you that the requirements for sputtering targets are higher than those of the traditional material industry, such as size, flatness, purity, impurity content, density, N/O/C/S, grain size and defect control ;Higher requirements or special requirements include: surface roughness, resistance value, grain size uniformity, composition and structure uniformity, foreign matter (oxide) content and size, magnetic permeability, ultra-high density and ultra-fine grains, etc. 

Rhenium sputtering target manufacturers tell you that magnetron sputtering coating is a new type of physical vapor coating method, which uses an electron gun system to emit and focus electrons on the material to be plated, so that the sputtered atoms follow the momentum conversion principle to The higher kinetic energy detaches the material and flies to the substrate to deposit a film. This plated material is called a sputtering target. Rhenium sputtering target manufacturers tell you that sputtering targets include metals, alloys, ceramic compounds, etc.
Rhenium sputtering target manufacturers tell you that sputtering targets are mainly used in the electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memories, electronic control devices, etc.; they can also be used in the field of glass coating; Rhenium sputtering target manufacturers tell you You can also apply to wear-resistant materials, high temperature corrosion resistance, high-end decorative products and other industries.