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Ruthenium target,Ru sputtering target
Ruthenium target is mainly used in the field of vacuum coating
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Product description
Parameters
Application
Ruthenium target is mainly used in the field of vacuum coating
Product specifications
Physical properties |
Color |
Hard, brittle silver rare metal |
Density |
12.37g/cm³ |
|
Melting point |
2250℃ |
|
Technical index |
Purity |
99.95% |
Relative density |
>99% |
|
Flatness of section |
3.2Ra |
|
Tolerance |
±0.1mm |
|
Grain size | Evenly | |
Material |
Ru |
|
Product specifications | Specification 01 Multi-arc target: diameter<1000mm thickness>1mm | |
Specification 02 Rectangle: Length: Unlimited Width: Unlimited Thickness: Unlimited Rectangular/sheet/step (length and width can be spliced) | ||
Specification 03 Cylinder: outer diameter <420mm inner diameter>1mm wall degree>1mm length>1mm (pipe/ring/rotating target) | ||
Specification 04: particle ball type, powder type | ||
Specification 05: Customized according to user needs, processing with samples and drawings | ||
Minimum order quantity | 1 piece, large quantity discount | |
Delivery date | Large quantities of raw materials in various sizes are available for long-term supply and reliable quality. | |
Craftsmanship | Vacuum magnetic levitation smelting, casting into ingots, thermomechanical treatment and precision machining | |
Application |
Vacuum coating, experimental or research grade ruthenium targets, electronics, optoelectronics, military, decorative plating, functional films, etc. | |
Product advantages | Reliable quality and favorable price | |
Vacuum smelting, purification preparation, high purity, less impurities | ||
Dense rolling, less oxidation, plastic molding | ||
Relatively high density, uniform and equiaxed crystal grains, high consistency | ||
Product accessories | Formal quotation/purchase and sales contract/packing list/material analysis and inspection list/formal invoice | |
Packing | Vacuum packaging |
Typical chemical analysis
Impurities(ppm) |
|||||||
Os |
Pt |
Ni |
Fe |
Si |
Pd |
Ti |
As |
4 |
2 |
2 |
5 |
8 |
2 |
2 |
2 |
Bi |
Cu |
Zr |
Ca |
Zn |
Se |
Mg |
|
2 |
2 |
2 |
2 |
2 |
2 |
2 |
|
Impurities (below the detection range of the instrument)(ppm) |
|||||||
V |
Sn |
Rh |
Ir |
Mo |
Ag |
Cd |
Sb |
<2 |
<2 |
<2 |
<2 |
<2 |
<2 |
<2 |
<2 |
Mn |
Al |
Co |
Te |
Au |
B |
Pb |
Cr |
<2 |
<2 |
<2 |
<2 |
<2 |
<2 |
<2 |
<2 |
Keyword:
Ruthenium target
Ru sputtering target
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Ruthenium ingot
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