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High purity tungsten target
High purity tungsten target
High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5N or 6N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.
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Ruthenium ingot
Ruthenium ingot
Ruthenium ingots are usually used as alloying element additives to manufacture high-temperature alloys for aviation.
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Tungsten nickel chromium target
Tungsten nickel chromium target
Tungsten-Ni-Cr/Tungsten-Ni-Cr/Ni-Cr targets are mostly used in the special glass coating industry, and the technical specifications can be customized.
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Ruthenium target,Ru sputtering target
Ruthenium target,Ru sputtering target
Purity: 99.95%
Ruthenium target is mainly used in the field of vacuum coating
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Iridium target,Ir sputtering target
Iridium target,Ir sputtering target
Purity: 3N5
Size: 1-10 inches, unconventional size can be customized.
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osmium target, Os sputtering target,os target
osmium target, Os sputtering target,os target
Chemical purity: 99.95%
Size: Diameter 20~300mm, thickness 1~60mm, customized according to requirements
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Spherical cobalt powder
Spherical cobalt powder
The physical and chemical properties of cobalt determine that it is an important raw material for the production of heat-resistant alloys, hard alloys, anti-corrosion alloys, magnetic alloys and various cobalt salts.
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Spherical nickel powder
Spherical nickel powder
Spherical nickel powder used in thermal spray materials, powder metallurgy, welding materials, electrical engineering, cemented carbide and other industries.
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Spherical molybdenum powder
Spherical molybdenum powder
Spherical molybdenum powder is widely used in the fields of plasma surface spray welding of high-speed wear-resistant parts of aerospace and automobile engines, precision forming of electronic components, high-performance target materials and 3D printing.
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Spherical niobium powder
Spherical niobium powder
Spherical niobium powder mainly used in superconducting materials, producing nickel, cobalt and iron-based superalloys.
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Spherical chromium powder
Spherical chromium powder
Chromium is used to make stainless steel, auto parts, tools, tapes and video tapes, etc. Chromium plating on metal can prevent rust, also called more than meters, strong and beautiful. As the most important metal in modern technology, chromium-nickel steel fused with different percentages is ever-changing and diverse.
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Spherical tantalum powder
Spherical tantalum powder
Tantalum has the characteristics of low elastic modulus, high friction coefficient, excellent tissue endogeneity and cartilage conductivity, high strength, strong corrosion resistance, and outstanding biocompatibility. It is an ideal human bone substitute material.
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Spherical vanadium powder
Spherical vanadium powder
Spherical vanadium powder has good fluidity and high hardness. Adding to metal can increase the hardness and toughness, corrosion resistance, wear resistance and the ability to withstand punching loads.
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Tungsten Titanium target
Tungsten Titanium target
High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.
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